Lumina As/P MOCVD Systems for Photonics Applications

The Lumina MOCVD platform incorporates the proprietary TurboDisc® reactor technology for outstanding film uniformity, yield and device performance for a variety of photonics applications.

Lumina As/P MOCVD Systems for Photonics Applications


Enabling As/P-based Photonics Devices with Over 20 Years of High-Volume MOCVD Experience
The Lumina R480 and R480S systems are based on Veeco’s industry leading MOCVD TurboDisc® technology which features excellent uniformity and low defectivity over long campaigns for exceptional yield and flexibility. In addition, Veeco’s proprietary technology drives uniform thermal control for excellent thickness and compositional uniformity. Providing a seamless wafer size transition, the system is capable of depositing high quality As/P epitaxial layers on wafers up to six inches in diameter. The R480 and R480S systems allow users to customize their systems for maximum value.

Designed to advance next generation devices

VCSELS

  • 3D Sensing
  • LiDAR
  • High Speed Data Communication

Edge-Emitting Lasers

  • Advanced Optical Communications
  • Silicon Photonics

Mini and Micro LEDs

  • 4K and 8K Television Displays
  • Smartphones
  • Wearable Devices
  • AR/VR (Augmented Reality / Virtual Reality)

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