Uniformity over large substrates, reproducibility, and low temperature deposition make ALD an ideal candidate for the next generation of large-scale manufacturing thin film technology.
If you have production ALD needs, then our Phoenix® production ALD system is the right choice. Phoenix® is a batch ALD tool capable of holding a large number of substrates at one time. Its unique chamber design assures accurate films from batch to batch
With its long campaigns and enhanced serviceability, the Firebird™ HVM ALD system meets and exceeds your cost-of-ownership requirements from small batch pre-production evaluation all the way to ramped-up production. Providing throughputs up to 40,000 wafers a month, the Firebird™ combines best-in-class productivity, superior film performance and low cost of operation to meet your most demanding high-volume manufacturing needs for specialized wafer production.