Ion Beam Etch

Etch precise, complex features for high-yield production of discrete microelectronic devices and components with the NEXUS® Ion Beam Etch (IBE) Systems.

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Etch Systems

Etch precise, complex features for high-yield production of discrete microelectronic devices and components with the NEXUS® Ion Beam Etch (IBE) Systems.

Stand-alone ion beam etch system with low cost of ownership and highest quality etch attributes
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Maximize slider yields and achieve excellent ion beam etch uniformity with the NEXUS® IBE™ Ion Beam Etching System.
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